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【Article】Machine Learning for Polymer Chemical Resistance to Organic Solvents
Shogo Kunieda, Mitsuru Yambe, Hiromori Murashima, Takeru Nakamura, Toshiaki Shintani, Hitoshi Kamijima, Yoshihiro Hayashi, Yosuke Hanawa, Ryo Yoshida
“Machine Learning for Polymer Chemical Resistance to Organic Solvents”
arXiv:2509.05344
DOI: 10.48550/arXiv.2509.05344